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Postsilanisation Treatment
SiOx, Laser Treated
Silanisation of SiO2 Layer
Laser Induced Amorphization of Silicon

Surface Engineering

Imaging Ellipsometry

The main attempt of silanization is to form bonds across the interface between mineral/inorganic components and organic components present in paints, adhesives etc., or as the anchor for further steps of surface modifications.

This step proved to be difficult to measure with conventional methods. As for imaging ellipsometry, it provides the sensitivity to investigate e.g. the formation of bonds in a structured array for the use in micro-arrays without the need of an additional fluorescence marker, making it an exceptional device.

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Postsilanisation Treatment
SiOx, Laser Treated
Silanisation of SiO2 Layer
Laser Induced Amorphization of Silicon

Compendium: Silanized Surfaces (pdf)

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Microscopic Mapping: Post Application Treated Silanefilm (pdf)

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Detection of atmospheric pressure plasma-induced removal of fingerprints via analysis of histograms obtained by imaging ellipsometry (2021)

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Single Femtosecond Laser-Pulse-Induced Superficial Amorphization and Re-Crystallization of Silicon (2021)

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Spectroscopic Imaging Ellipsometry of Self-Assembled SiGe/Si Nanostructures (2017)

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Visualization of low-contrast surface modifications: thin films, printed pattern, laser-induced changes, imperfections, impurities, and degradation (2016)

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